Composition for preparing porous dielectric thin films
AssigneeSamsung Electronics Co., Ltd.
InventorsYi Yeol Lyu, Kwang Hee Lee, Ji Man Kim, Seok Chang, Jin Heong Yim, Jae Geun Park
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Abstract
The present invention provides a composition for preparing porous dielectric then films containing pore-generating material, said composition comprising gemini detergent, and/or a quaternary alkyl ammonium salt, a thermo-stable organic or inorganic matrix precursor, and solvent for dissolving the two solid components. There is also provided an interlayer insulating film having good mechanical properties such as hardness, modulus and hydroscopicity, which is required for semiconductor devices.
Claims21
A composition for preparing a porous dielectric thin film which comprises:
- (1) a pore generating material of gemini detergent represented by the formula (8), quaternary alkyl ammonium salt represented by the formula (9) or mixture therefore;
- (2) thermo-stable organic or inorganic matrix precursor;
- and
- (3) a solvent for dissolving both the said material and/or salt and the matrix precursor:
- 9
- wherein
- R1 and R2 are independently a methyl group or a ethyl group;
- R3 is a C5˜40 alkyl group;
- X is a halogen atom;
- r is independently a hydrogen atom, a methyl group or a C1˜10 alkoxy group;
- j is 0 or 1;
- n is an integer from 0 to 10, and
- m is an integer from 0 to 10, and
- NL1L2L3L4X [9]
- wherein
- N is a nitrogen atom;
- X is a halogen atom;
- and
- L1, L2, L3, and L4 are independently a C1˜30 alkyl group.
Dependencies are inferred from the claim text.