Manufacturing method and manufacturing apparatus for a gas discharge panel
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsYoshiki Sasaki, Junichi Hibino, Hiroyosi Tanaka, Akira Shiokawa, Masafumi Ookawa
Life of this patent
Estimating the term…
Abstract
A manufacturing method for a gas discharge panel according to the invention can reduce the amount of water and gaseous molecules, which are absorbed into the first and the second substrates, to a minimum by keeping the both substrates under a reduced pressure, and therefore can prevent a degradation of a discharge gas filling the finished panel. As a result, problems in the finished panel such as increase in a discharge starting voltage and generation of an abnormal discharge can be suppressed.
Claims14
A manufacturing method for a gas discharge panel that has a first substrate on which a protective layer is formed and a second substrate on which phosphor layers are formed, the manufacturing method comprising an alignment step for arranging the first substrate and the second substrate at predetermined locations, while opposing the first substrate and the second substrate,
- wherein the alignment step is conducted under a reduced pressure.
A manufacturing method for a gas discharge panel that has a first substrate on which a protective layer is formed and a second substrate on which phosphor layers are formed, the manufacturing method comprising an alignment step for arranging the first substrate and the second substrate at predetermined locations, while opposing the first substrate and the second substrate,
- wherein the alignment step is conducted in dry gas.
A manufacturing apparatus for a gas discharge panel having a first substrate carrying mechanism, a second substrate carrying mechanism, and an alignment mechanism,
- wherein each mechanism is provided in different hermetically sealed chambers, which each include at least one of a gas supplying mechanism and a gas exhausting mechanism.
Dependencies are inferred from the claim text.