Method and structure for reducing contact aspect ratios
AssigneeMicron Technology, Inc.
InventorsScott J. Deboer, Vishnu K. Agarwal
Life of this patent
Estimating the term…
Abstract
An intermediate metal plug is used to raise the platform to which contact is to be made. In the illustrated process, a partial bit line plug is formed adjacent a stacked capacitor, and an interlevel dielectric formed over the capacitor. The bit line contact is completed by extending a via from the bit line, formed above the interlevel dielectric, down to the level of the intermediate plug, and the via is filled with metal. The height of the via to be filled is thus reduced by the height of the intermediate plug. In one embodiment, the intermediate plug is slightly shorter than an adjacent container-shaped capacitor. In another embodiment, the intermediate plug is about as high as an adjacent stud capacitor.
Claims25
A method of forming electrical contact between levels in an integrated circuit, the method comprising:
- forming a conductive plug beginning from a first level;
- covering said conductive plug with a shield;
- at least partially forming an electrical device beginning from the first level adjacent the conductive plug while the conductive plug is covered with the shield;
- opening the shield;
- and
- extending a contact to directly contact the conductive plug after opening the shield,
- wherein the electrical device is distinct from a conductive plug.
A method of forming a contact adjacent electrical devices in an integrated circuit, the method comprising:
- forming an electrical device independent of a conductive plug, the electrical device extending from a first level to a second level;
- forming an insulating layer above the electrical device;
- etching a via adjacent the electrical device, the via exposing a conductive element extending from the first level to a position between the first level and the second level;
- and
- filling the via with a conductive material to form the contact.
Dependencies are inferred from the claim text.