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US 2004/0105163 A1Published application
Optical materials with selected index-of-refraction
AssigneeNeoPhotonics Corporation
InventorsMichael A. Bryan, Nobuyuki Kambe
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AssigneeNeoPhotonics Corporation
InventorsMichael A. Bryan, Nobuyuki Kambe
Estimating the term…
Photosensitive optical materials are used for establishing more versatile approaches for optical device formation. In some embodiments, unpatterned light is used to shift the index-of-refraction of planar optical structures to shift the index-of-refraction of the photosensitive material to a desired value. This approach can be effective to produce cladding material with a selected index-of-refraction. In additional embodiments gradients in index-of-refraction are formed using, photosensitive materials. In further embodiments, the photosensitive materials are patterned within the planar optical structure. Irradiation of the photosensitive material can selectively shift the index-of-refraction of the patterned photosensitive material. By patterning the light used to irradiate the patterned photosensitive material, different optical devices can be selectively activated within the optical structure.
A method for altering the index-of-refraction of an optical material, the method comprising irradiating a planar optical structure comprising a photosensitive material with light at a wavelength appropriate to shift the index-of-refraction of the photosensitive material, wherein the light is not patterned.
A method for producing a gradient in index-of-refraction in an optical material comprising a photosensitive optical material, the method comprising irradiating the photosensitive optical material to create a light-induced gradient in index-of-refraction.
A method for altering a pattern in index-of-refraction in a optical material, the method comprising irradiating with light at least a portion of an optical material wherein the at least a portion of optical material comprises a composition variation resulting in a spatial pattern of photosensitive optical material and wherein absorption of the light shifts the index-of-refraction of the irradiated photosensitive optical material to produce an altered pattern of index-of-refraction.
An optical structure comprising a photosensitive optical material wherein at least a portion of the photosensitive optical material has a light-induced index-of-refraction change that is not patterned.
An optical structure comprising a photosensitive optical material with a light-induced gradient in index-of-refraction.
An optical structure comprising a pattern of photosensitive optical material wherein at least a portion of the photosensitive material has a light-induced shift in index-of-refraction.
A method for fabricating a material, the method comprising:
A method of cleaving a layer from a material, the method comprising:
A silicon oxide material having a fracture band of impurities below the surface of the material.
Dependencies are inferred from the claim text.