Radiation source, lithographic apparatus and device manufacturing method

A radiation source comprising an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between said anode and said cathode to form a plasma so as to generate electromagnetic radiation, said radiation source comprising a triggering device configured to initiate said discharge by irradiating a surface proximate said discharge space with an energetic beam.

A method for operating a radiation source, constructed to have a low inductance, and comprising an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between said anode and said cathode to form a plasma so as to generate electromagnetic radiation, said method comprising generating an initial discharge followed by operating said radiation source so as to allow successive discharges to occur due to a substantially self-regulated oscillation within said discharge source.

A device manufacturing method comprising:

• providing a projection beam of radiation using a radiation system comprising a radiation source comprising an anode and a cathode that are configured and arranged to create a discharge, within a discharge element, in a substance in a discharge space between said anode and said cathode to form a plasma so as to generate a projection beam of radiation, said radiation source comprising a plurality of discharge elements;
• using a patterning device to endow the projection beam with a pattern in its cross-section;
• projecting the patterned beam of radiation onto a target portion of a substrate.

A device manufacturing method comprising:

• providing a projection beam of radiation using a radiation system comprising a radiation source comprising an anode and a cathode that are configured and arranged to create a discharge in a substance in a discharge space between said anode and said cathode to form a plasma so as to generate a projection beam of radiation, said radiation source comprising a triggering device configured to initiate said discharge by irradiating a surface proximate said discharge space with an energetic beam;
• using a patterning device to endow the projection beam with a pattern in its cross-section;
• projecting the patterned beam of radiation onto a target portion of a substrate.