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US 2004/0105081 A1Published application
Lithographic apparatus, device manufacturing method, and device manufactured thereby
AssigneeASML Netherlands B.V.
InventorKoen Van Ingen Schenau
Life of this patent
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Abstract
A transport unit transfers a substrate between a chamber enclosing a substrate table and a processing unit that process a substrate before and after exposure in a substantially contaminant free environment to minimize the exposure of the resist on the substrate to the contaminants.
Claims19
A lithographic projection apparatus, comprising:
- a radiation system configured to provide a projection beam of radiation, the projection beam being patterned by a patterning device;
- a substrate table configure to hold a substrate;
- a projection system configured to project the patterned beam onto a target portion of the substrate;
- a processing unit configured to process the substrate at least one of before and after the substrate has been exposed to the projection beam;
- a transport unit configured to transport the substrate between the substrate table and the processing unit;
- and
- a contamination control device configured to control the partial pressure of H2O in the transport unit to be less than 1×10−2 mbar, the partial pressure of hydrocarbons in the transport unit to be less than 1×10−4 mbar, and the partial pressure of amine bases in the transport unit to be less than 1×10−6 mbar.
4 more elements
A device manufacturing method, comprising:
- providing a substrate that is at least partially covered by a layer of radiation-sensitive material;
- projecting a patterned beam of radiation onto a target portion of the layer of radiation-sensitive material;
- and
- transporting the substrate in a transport unit between a substrate table and a processing unit configured to process the substrate at least one of before and after it has been exposed by the patterned beam of radiation, wherein a partial pressure of H2O in the transport unit is less than 1×10−2 mbar, a partial pressure of hydrocarbons in the transport unit is less than 1×10−4 mbar, and a partial pressure of amine bases in the transport unit is less than 1×10−6 mbar.
1 more element
Dependencies are inferred from the claim text.