Method for toolmatching and troubleshooting a plasma processing system

A program storage device readable by a machine, tangibly embodying a program of instructions executable by the machine to perform a method for testing a plasma processing system having a grounded chamber and a bottom electrode, the method comprising:

• measuring a first capacitance value between the bottom electrode and the grounded chamber at atmosphere;
• installing consumable hardware parts to the chamber;
• measuring a second capacitance value between the bottom electrode and the grounded chamber at vacuum, said grounded chamber including said consumable hardware parts;
• and
• comparing said first capacitance value with a first reference value, said second capacitance value with a second reference value, to identify and determine any defects in the plasma processing system, said first and second reference value respectively representative of the capacitance of a defect-free chamber at atmosphere and the capacitance of a defect-free chamber including said consumable hardware parts at vacuum.

An apparatus for testing a plasma processing system having a grounded chamber and a bottom electrode, the apparatus comprising:

• means for measuring a first capacitance value between the bottom electrode and the grounded chamber at atmosphere, and a second capacitance value between the bottom electrode and the grounded chamber at vacuum, said grounded chamber at vacuum including at least one installed consumable hardware part;
• means for comparing said first capacitance value with a first reference value, said second capacitance value with a second reference value;
• and
• means for identifying and determining any defects in the plasma processing system, said first and second reference value respectively representative of the capacitance of a defect-free chamber at atmosphere and the capacitance of a defect-free chamber including at least one installed consumable hardware part at vacuum.