Metallic very thin film, metallic very thin film multilayer body, and method for manufacturing the metallic very thin film or the metallic very thin film laminate

(Amended) An ultra-thin metal multilayer film comprising ultra-thin metal films composed of single metal atoms consisting of two-dimensionally continuous multilayer, characterized in that said ultra-thin metal multilayer film is formed on the surface of a conductive base material that exhibits metallic conduction through a thin dielectric film.

(Amended) A method of fabricating an ultra-thin metal film or an ultra-thin metal multilayer film, characterized in that a thin dielectric film is formed on a conductive base material that exhibits metallic conduction in a film thickness that causes the significantly tunneling effect between metals through said thin dielectric film, or a film thickness whereby the valence electrons and holes of the metal composing the conductive base material and the ultra-thin metal film are affected by the many-body effects;

• and the ultra-thin metal films are grown in layer-by-layer, wherein each one atom layer forms a two-dimensionally continuous film, on said thin dielectric film by the deposition method.

A method of fabricating an ultra-thin metal film or an ultra-thin metal multilayer film, characterized in that a dielectric single-crystal film is formed on the surface of a metallic base material through a thin dielectric single-crystal film having a film thickness that causes the significantly tunneling effect between metals through said thin dielectric single-crystal film, or a film thickness whereby the valence electrons and holes of the metal composing the metallic base material and the ultra-thin metal film are affected by the many-body effects;

• and the ultra-thin metal films are grown in layer-by-layer on said thin dielectric single-crystal film by the deposition method.

A method of fabricating an ultra-thin metal film or an ultra-thin metal multilayer film, characterized in that a thin dielectric film is formed on a conductive base material that exhibits metallic conduction in a film thickness wherein the band-gap width of said dielectric is narrowed;

• and the ultra-thin metal films are grown in layer-by-layer on said thin dielectric film by the deposition method.

A method of fabricating an ultra-thin metal film or an ultra-thin metal multilayer film, characterized in that a thin dielectric single-crystal film is formed on a metallic base material in a film thickness wherein the band-gap width of said dielectric is narrowed;

• and the ultra-thin metal films are grown in layer-by-layer on said thin dielectric single-crystal film by the deposition method.