Growth of high temperature, high power, high speed electronics
OwnerTheodore D. Moustakas, William Stacey +2inventors
InventorsTheodore D. Moustakas, William Stacey, Philip Lamarre, Robert Scott Morris
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Abstract
High quality epitaxial layers of monocrystalline materials can be grown overlying monocrystalline substrates such as SiC or sapphire by forming a compliant substrate for the growing the monocrystalline layers. Devices and methods for fabricating silicon carbide based heterojunction bipolar devices such as transistors and diodes. These devices are suitable for high power and/or high speed and/or high temperature electronic applications.
Claims6
A method for forming a monocrystalline layer of GaN directly on SiC
Using the method of 1. a high quality heteojunction diode is formed.
Using the method of 1. a high quality high speed heterojunction bipolar transistor is formed
Using the method of 1. a high quality high power photo-activated heterojunction bipolar transistor is formed
Using the method of 1. a high quality high power electrically-activated heterojunction bipolar transistor is formed
Using the method of 1. an anomalously low p-GaN resistivity can be achieved.
Dependencies are inferred from the claim text.