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AssigneeMatsushita Elec. Ind. Co. Ltd.
InventorsNaomi Kaneko, Naohide Wakita, Hiroshi Satani, Tsuyoshi Uemura
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The present invention provides a method of forming a transparent conductive film at a low temperature that is suitable for use with a synthetic resin substrate. According to the production method of a substrate with an electrode of the present invention, an oxide conductive film composed of an amorphous material or mainly composed of an amorphous material is formed on a substrate at a temperature equal to or less than the crystallization temperature of the film, and subsequently, the formed oxide conductive film is crystallized by heating. The oxide conductive film is processed into the shape of an electrode either before or after crystallization, according to necessity.
A substrate with an electrode comprising a substrate and an electrode made of an oxide conductive film disposed on the substrate, wherein the electrode is composed of polycrystal having an average grain size of 25 nm or larger, a crystal being the largest constitutional unit having a boundary identifiable by surface observation.
A method of producing a substrate with an electrode, comprising the steps of:
Dependencies are inferred from the claim text.