Platen with patterned surface for chemical mechanical polishing
AssigneeApplied Materials, Inc.
InventorsGopalakrishna B. Prabhu, Erik S. Rondum, Peter McReynolds, Thomas H. Osterheld, Garlen C. Leung, Jack Arluck, Adam H. Zhong, Gregory E. Menk
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Abstract
A platen having a patterned upper surface for supporting a polishing material in a chemical mechanical polishing system is provided. In one embodiment, a platen for supporting a polishing material in a chemical mechanical polishing system includes a body adapted to support a polishing material during processing and having a substantially rigid non-planar upper support surface for supporting the polishing material during polishing.
Claims21
A platen for supporting the polishing material in a chemical mechanical polishing system, comprising:
- a body adapted to support a polishing material during processing;
- and
- a substantially rigid non-planar upper support surface defining an upper surface of the body for supporting the polishing material.
A platen for supporting the polishing material in a chemical mechanical polishing system, comprising:
- a body adapted to support a polishing material during processing;
- a substantially rigid non-planar upper support surface defining an upper surface of the body for supporting the polishing material;
- and
- a plurality of recesses formed in the upper support surface.
A chemical mechanical polishing system comprising:
- a platen having a non-planar, substantially rigid upper support surface;
- a polishing material disposed on the upper support surface;
- and
- a polishing head adapted to retain a substrate against a working portion of the polishing material during processing.
Dependencies are inferred from the claim text.