Dual mode hybrid control and method for CMP slurry
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChao-Jung Chang, Ping-Hsu Chen, Chin-Hsin Peng, Henry Lo, Chien-Kuo Lu, Chien-Ling Huang
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChao-Jung Chang, Ping-Hsu Chen, Chin-Hsin Peng, Henry Lo, Chien-Kuo Lu, Chien-Ling Huang
Estimating the term…
A DMHC (dual mode hybrid control) system and method which facilitates enhanced control in the delivery of polishing slurry to a CMP (chemical mechanical polishing) apparatus. The DMHC comprises a linear table and a PID (proportional integrated differential) controller operably connected to a slurry pump provided in a slurry flow conduit which delivers the polishing slurry to the CMP apparatus. A bubble trap and a flowmeter provided in the slurry flow conduit downstream of the slurry pump are operably connected to the PID controller, and the CMP apparatus is located downstream of the flowmeter.
A method for controlling transport of a fluid through a conduit, comprising the steps of:
A method for controlling transport of a fluid through a conduit, comprising the steps of:
A system for controlling transport of a fluid, comprising:
Dependencies are inferred from the claim text.