Micropattern forming material and fine structure forming method
AssigneeRenesas Technology Corp.
InventorsMamoru Terai, Toshiyuki Toyoshima, Takeo Ishibashi, Shinji Tarutani
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AssigneeRenesas Technology Corp.
InventorsMamoru Terai, Toshiyuki Toyoshima, Takeo Ishibashi, Shinji Tarutani
Estimating the term…
A micropattern forming material comprising a water-soluble component, water and/or an organic solvent miscible with water is used. The water-soluble component is made of at least one selected from the group water-soluble monomers, water-soluble oligomers, copolymers of water-soluble monomers and salts thereof, having a functional group reactable with a carboxyl group. The micropattern forming material is formed on a resist pattern 4 capable of supplying an acid, and a film 6 insoluble in water or an alkali is formed through crosslinking reaction of the water-soluble component at a portion in contact with the resist pattern 4 by the action of the acid from the resist pattern.
A micropattern forming material comprising;
A method for forming a fine structure, comprising:
Dependencies are inferred from the claim text.