Photoresist compositions

A radiation sensitive composition comprising:

• a) a first photoacid generator (PAG) compound P1, which comprises one or more compounds of the structure (A);
• b) a second photoacid generator compound P2 which comprises one or more compounds of the structure (B);
• c) a polymer component comprising an alkali soluble resin component whose alkali solubility is suppressed by the presence of acid sensitive moieties and whose alkali solubility is returned by treatment with an acid and, optionally, heat;
• wherein said polymer comprises one or more polymers comprising the monomer unit (C);
• and
• d) a solvent;
• wherein structure (A) has the formula:
• 22
• wherein R1 and R2 are each independently selected from the group consisting of C1-C12 fluoroalkyl groups or together R1 and R2 are joined with the N to form a (F2C)yN ring where y=4-12;
• R3, R4, and R5 are each independently selected from the group consisting of unsubstituted aryl, alkyl or alpha-ketomethyl groups or such groups substituted with an acid sensitive group, or R3 and R4 together with the S atom form a cycloalkylsulfonium ring;
• R6 to R11 and R6′ to R11′ are independently selected from the group consisting of branched or linear alkyl, alkoxy, halogen, hydrogen, OCO2G, OCH2CO2G, and OG where G=an acid sensitive group;
• wherein structure (B) has the formula:
• 23
• wherein each R12 is independently selected from the group consisting of a linear, cyclic, or branched C1-C8 fluoroalkyl group, substituted or unsubstituted phenyl group, substituted or unsubstituted naphthalene group, C6-C12 cyclic or alicyclic hydrocarbon, and a linear, cyclic, or branched C1-C8 alkyl group;
• and
• wherein monomeric unit (C) has the formula:
• 24
• wherein R13 is selected from the group consisting of H, C1-C4 lower alkyl, CN, and CH2CO2R20;
• R14 and R15 are each independently selected from the group consisting of H, linear or branched C1-C4 alkyl, and halogen;
• R16 is selected from the group consisting of H and branched or linear C1-C4 alkyl;
• R17 is selected from the group consisting of substituted or unsubstituted phenyl, a substituted or unsubstituted linear, branched or cyclic C1-C20 alkyl, optionally containing an ether or ester group, a substituted or unsubstituted phenylalkylene, and a substituted or unsubstituted C6-C20 cyclic alkylene ;
• R18 and R19 are each independently selected from the group consisting of H, linear or branched or cyclic C1-C14 alkyl, and C7-C14 alicyclic;
• R20 is selected from the group consisting of a C1-C14 branched, linear or cyclic alkyl, substituted or unsubstituted phenyl, and C7-C14 alicyclic group.