Low vapor pressure, low debris solid target for EUV production

An extreme ultraviolet (EUV) radiation source for generating EUV radiation, said source comprising:

• a nozzle assembly, said nozzle assembly including a condenser chamber having a condenser for cryogenically cooling a gas target material to a liquid target material, said nozzle assembly further including a filter for filtering the liquid target material, said nozzle assembly further including a holding chamber receiving the liquid target material and holding the target material under pressure to allow entrained gas bubbles in the liquid target material to be converted to liquid, said nozzle assembly further including a capillary outlet tube coupled to the holding chamber, said outlet tube receiving the liquid target material from the holding chamber and emitting a stable stream of the target material from the nozzle assembly towards a target area;
• and
• a laser, said laser directing a laser beam to the target area to vaporize the target material and create a plasma that emits the EUV radiation.

An extreme ultraviolet (EUV) radiation source for generating EUV radiation, said source comprising:

• a nozzle assembly, said nozzle assembly including a condenser chamber having a condenser for cryogenically cooling a gas target material to a liquid target material, said nozzle assembly further including a capillary outlet tube coupled to the condenser chamber, said outlet tube receiving the liquid target material from the condenser chamber and emitting a stream of the target material from the nozzle assembly towards a target area, said nozzle assembly further including a thermal shield formed around the capillary outlet tube, said thermal shield maintaining the temperature of the liquid target material as it propagates through the outlet tube;
• and
• a laser, said laser directing a laser beam to the target area to vaporize the target material and create a plasma that emits EUV radiation.