Method for manufacturing color filter

A method for manufacturing a color filter comprising:

• (1) forming a wettability changeable layer, which a wettability changes by a function of a photocatalyst, on a transparent base material, on a pixel part forming part which is a part on the transparent base material where pixel part is formed;
• (2) forming a light shielding part on the boundary part of the pixel part forming part provided with the wettability changeable layer;
• (3) placing a photocatalyst containing layer of a photocatalyst containing layer side substrate, which is the photocatalyst containing layer containing a photocatalyst formed on a base member, and the wettability changeable layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to obtain the pixel part forming part as a lyophilic area where the contact angle to a liquid is lowered compared with a state before the energy irradiation;
• and
• (4) coloring the pixel part forming part, provided as a lyophilic area, by an ink jet method so as to form a pixel part.

A method for manufacturing a color filter comprising:

• (1) forming a wettability changeable layer, which a wettability changes by a function of a photocatalyst, on a transparent base material, on a light shielding part forming part which is a part on the transparent base material where light shielding part is formed;
• (2) coloring a part on the transparent base material, where the wettability changeable layer is not firmed, by an ink jet method so as to form a pixel part;
• (3) placing a photocatalyst containing layer of a photocatalyst containing layer side substrate, which is the photocatalyst containing layer containing a photocatalyst formed on a base member, and the wettability changeable layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to obtain the light shielding part forming part as a lyophilic area where the contact angle to a liquid is lowered compared with a state before the energy irradiation;
• and
• (4) forming a light shielding part in the light shielding part forming part provided as the lyophilic area.

A method for manufacturing a color filter comprising:

• (1) placing a wettability changeable layer, which a wettability changes by a function of a photocatalyst, and a photocatalyst containing layer of a photocatalyst containing layer side substrate, which is the photocatalyst containing layer containing a photocatalyst formed on a base member, with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form the light shielding part forming part, in a pattern, comprising a lyophilic area where the contact angle to a liquid is lowered compared with a state before the energy irradiation;
• (2) forming a light shielding part in the light shielding part forming part provided as the lyophilic area;
• (3) placing a wettability changeable layer with the light shielding part formed thereon and a photocatalyst containing layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a pixel part forming part, in a pattern, comprising a lyophilic area where the contact angle to a liquid is lowered compared with a state before the energy irradiation;
• and
• (4) coloring the pixel part forming part provided as the lyophilic area by the ink jet method, so as to form a pixel part.

A method for manufacturing a color filter comprising:

• (1) placing a wettability changeable layer, which a wettability changes by a function of a photocatalyst, and a photocatalyst containing layer of a photocatalyst containing layer side substrate, which is the photocatalyst containing layer containing a photocatalyst formed on a base member, with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a pixel part foeming part, in a pattern, comprising a lyophilic area where the contact angle to a liquid is lowered compared with a state before the energy irradiation;
• (2) forming a pixel part by coloring the pixel part forming part provided as the lyophilic area by an ink jet method;
• (3) placing a wettability changeable layer with the pixel part formed thereon and a photocatalyst containing layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a light shielding part forming part, in a patter, comprising a lyophilic area where the contact angle to a liquid is lowered compared with a state before the energy irradiation;
• and
• (4) forming a light shielding part in the light shielding part forming part provided as the lyophilic area.

A method for manufacturing a color filter comprising:

• (1) forming a light shielding part on a wettability changeable layer, which a wettability changes by a function of a photocatalyst;
• (2) placing a photocatalyst containing layer of a photocatalyst containing layer side substrate, which is the photocatalyst containing layer containing a photocatalyst formed on a base member, and the wettability changeable layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a pixel part forming part, in a patter, comprising a lyophilic area where the contact angle to a liquid is lowered compared with a state before the energy irradiation;
• and
• (3) coloring the pixel part forming part provided as the lyophilic area by the ink jet method so as to form a pixel part.

A method for manufacturing a color filter comprising:

• (1) forming a light shielding part on a transparent base material;
• (2) forming a decomposition removal layer, on the surface of the transparent base material on the side with the light shielding part formed, having a higher contact angle to a liquid than the transparent base material surface, and is decomposed and removed by the function of a photocatalyst;
• (3) placing a photocatalyst containing layer of a photocatalyst containing layer side substrate, which is the photocatalyst containing layer containing a photocatalyst formed on a base member, and the decomposition removal layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a pixel part forming part, in a pattern, comprising the transparent base material bared by the decomposition removal of the decomposition removal layer;
• and
• (4) coloring the pixel part forming part by the ink jet method so as to form a pixel part.

A method for manufacturing a color filter comprising:

• (1) forming a decomposition removal layer, on the a transparent base material, having a higher contact angle to a liquid than the transparent base material surface and is decomposed and removed by the function of a photocatalyst;
• (2) placing the decomposition remocal layer and a photocatalyst containing layer of a photocatalyst containing layer side substrate, which is the photocatalyst containing layer containing a photocatalyst formed on a base member, with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a light shielding part forming part, in a pattern, comprising the transparent base material bared by the decomposition removal of the decomposition removal layer;
• (3) forming a light shielding part in the light shielding part forming part;
• (4) placing the decomposition removal layer with the light shielding part formed thereon, and the photocatalyst containing layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a pixel part forming part, in a pattern, comprising the transparent base material bared by the decomposition removal of the decomposition removal layer;
• and
• (5) coloring the pixel part forming part by an ink jet method so as to form a pixel part.

A method for manufacturing a color filter comprising:

• (1) forming a decomposition removal layer, on the a transparent base material, having a higher contact angle to a liquid than the transparent base material surface and is decomposed and removed by the function of a photocatalyst;
• (2) placing the decomposition remocal layer and a photocatalyst containing layer of a photocatalyst containing layer side substrate, which is the photocatalyst containing layer containing a photocatalyst formed on a base member, with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a pixel part forming part, in a pattern, comprising the transparent base material bared by the decomposition removal of the decomposition removal layer;
• (3) coloring the pixel part forming part by the ink jet method so as to form a pixel part;
• (4) placing the decomposition removal layer with the pixel part formed thereon, and the photocatalyst containing layer with a gap of 200 μm or less, and irradiating an energy from a predetermined direction to form a light shielding part forming part, in a pattern, comprising the transparent base material bared by the decomposition removal of the decomposition removal layer;
• and
• (5) forming a light shielding part in the light shielding part forming part.