Electron beam pattern generator with photocathode comprising low work function cesium halide
AssigneeApplied Materials, Inc.
InventorsJuan Ramon Maldonado, Steven T. Coyle
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Abstract
An electron beam pattern generator comprises a laser beam generator to generate a laser beam. A photocathode receives the laser beam and generates one or more electron beams. The photocathode comprises cesium halide material, such as for example, cesium bromide or iodide. The cesium halide material may have a decreased workfunction that allows efficient operation at a wavelength of the laser beam of at least about 200 nm. Electron optics are provided to focus the electron beams onto a substrate that is supported on a substrate support.
Claims27
An electron beam pattern generator comprising:
- (a) a laser beam generator to generate a laser beam;
- (b) a photocathode to receive the laser beam and generate an electron beam, the photocathode comprising cesium halide material;
- (c) electron optics to focus the electron beam onto a substrate;
- and
- (d) a substrate support to support the substrate.
An electron pattern generating method comprising:
- (a) providing a photocathode comprising cesium halide material;
- (b) directing a laser beam onto the cesium halide photocathode at a wavelength that is sufficiently low to cause an electron beam to be emitted therefrom;
- (c) modulating the laser beam or electron beam according to a pattern to form modulated electron beams;
- and
- (d) directing the modulated electron beams onto a substrate.
An electron beam pattern generator comprising:
- (a) a diode-pumped or argon-ion laser source and a BBO crystal to generate a laser beam;
- (b) a photocathode to receive the laser beam and generate an electron beam, the photocathode comprising a cesium bromide layer;
- (c) electron optics to focus the electron beam onto a substrate;
- and
- (d) a substrate support to support a substrate.
An electron beam pattern generator comprising:
- (a) a diode-pumped or argon-ion laser source and a BBO crystal to generate a laser beam;
- (b) a photocathode to receive the laser beam and generate an electron beam, the photocathode comprising a cesium iodide layer;
- (c) electron optics to focus the electron beam onto a substrate;
- and
- (d) a substrate support to support the substrate.
A method of manufacturing a photocathode for an electron beam pattern generator, the method comprising:
- (a) providing a substrate in a process zone, the substrate selected to be transparent to an incident laser beam;
- (b) evacuating the process zone;
- (c) evaporating a cesium halide material in the process zone to deposit cesium halide material on the substrate;
- and
- (d) activating the cesium halide material to form the photocathode.
Dependencies are inferred from the claim text.