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AssigneeHitachi, Ltd.
InventorsHiroshi Akiyama, Hiroshi Kubo, Kazuo Hiramoto
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A power supply for applying a voltage to a scanning electromagnet for deflecting a charged particle beam has a first power supply unit having no filter and a second power supply unit having a filter. When an irradiation position of the charged particle beam in an irradiation object is moved, the first power supply unit, namely a power supply unit having no filter, is used to apply the voltage to the scanning electromagnet, so that an exciting current flowing in the scanning electromagnet can be changed in a short time. Further, when the irradiation position of the charged particle beam is maintained, the second power supply is used to apply a voltage whose pulsating component was removed to the scanning electromagnet, so that the exciting current flowing in the scanning electromagnet can be controlled precisely. Consequently, the charged particle beam can be applied uniformly to the irradiation object and an irradiation time of the charged particle beam to the irradiation object can be curtailed.
A charged particle beam irradiation equipment, for applying a charged particle beam to an irradiation area, comprising a scanning electromagnet for deflecting a charged particle beam and a power supply for applying a voltage to the scanning electromagnet, characterized in that the power supply is equipped with a first power supply unit having no filter and a second power supply unit having a filter.
A charged particle beam irradiation equipment, for applying a charged particle beam to an irradiation area, comprising a scanning electromagnet for deflecting the charged particle beam and a power supply for applying a voltage to the scanning electromagnet, characterized in that
A method for controlling charged particle beam irradiation equipment having a scanning electromagnet for controlling an irradiation position of the charged particle beam in an irradiation object by deflecting the charged particle beam, characterized in that after the charged particle beam was applied to a first irradiation area in the irradiation object, the irradiation position of the charged particle beam is changed over to a second irradiation area in the irradiation object while the irradiation of the charged particle beam is being stopped, and subsequently, when the irradiation position of the charged particle beam is changed over to the second irradiation area in case the charged particle beam is applied to the second irradiation area, a voltage whose absolute value is larger than a voltage necessary to keep the irradiation position of the charged particle beam in the second irradiation areas is applied to the scanning electromagnet.
Dependencies are inferred from the claim text.