Activated water apparatus and methods
AssigneeHydro Enterprises, Inc.
InventorsGeorge Paskalov, Mark Gorodkin, Viktor Sokolov
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Abstract
An apparatus subjects water to waves from an RF plasma. This allows continuous production of “activated water” characterized by cluster sizes below about 4 molecules per cluster, water having pH below 4 or above 10, or water having ORP of less than −350 mV or more than +800 mV. The basic frequency of the plasma is preferably between 0.44 MHz and 40.68 MHz, and the plasma is preferably modulated at a frequency between 10 kHz and 34 kHz. Flow rates typically range from 20 l/hr to about 2000 l/hr. Activated water can be used for many purposes, including antimicrobial cleaning of worktable, floor, wall, knife, transport and other surfaces, for example, in meat processing facilities and hospitals.
Claims18
An apparatus comprising:
- a wave generator that produces waves at a radio frequency;
- a processing vessel that subjects water to the waves for sufficient time to produce processed water with at least one the following characteristics:
- a mean cluster size of less than 4 molecules per cluster;
- a measured pH of less than 4, a measured pH of greater than 10, a measured ORP of less than −350 mV, and a measured ORP of greater than +800 mV.
A method of cleaning a surface having a bacterial population, comprising:
- subjecting water to an RF energy source that alters a measured pH of the water to less than 4;
- and
- applying the altered water to the surface under conditions that kill at least 80% of the bacterial population.
Continuously produced water having a measured pH of less than 4 or greater than 10.
Continuously produced water having a measured Oxidation Reduction Potential (ORP) of less than −350 mV or more than +800 mV.
Dependencies are inferred from the claim text.