Microwave plasma processing apparatus

A microwave plasma processing apparatus, comprising:

• a microwave generator for providing microwave and optimally adjusting microwave impedance to match between different loading terminals;
• a plasma promoter connected to the microwave generator, for inducing the microwave to be in a transverse magnetic (TM) mode;
• a microwave plasma processing chamber connected to the plasma promoter, for inducing processing gas in the microwave plasma processing chamber via the TM-mode microwave to form plasma for use in vapor deposition;
• a vacuum gas-discharging chamber disposed under the microwave plasma processing chamber, and connected via a chamber window to a pressure reducing device for reducing inner pressure of the microwave plasma processing chamber;
• and
• a loading elevator for positioning a sample to be processed in the microwave plasma processing chamber;
• wherein the microwave plasma processing chamber comprises:
• a gas distribution panel for evenly introducing the processing gas into the microwave plasma processing chamber via a plurality of slantwise gas outlets disposed on the gas distribution panel;
• and
• a sample holder for holding the sample.

A microwave plasma processing apparatus, comprising:

• a microwave generator for providing microwave and optimally adjusting microwave impedance to match between different loading terminals,
• a plasma promoter connected to the microwave generator, for inducing the microwave to be in a transverse magnetic (TM) mode;
• a microwave plasma processing chamber connected to the plasma promoter, for inducing processing gas in the microwave plasma processing chamber via the TM-mode microwave to form plasma for use in vapor deposition;
• a vacuum gas-discharging chamber disposed under the microwave plasma processing chamber, and connected via a chamber window to a pressure reducing device for reducing inner pressure of the microwave plasma processing chamber;
• and
• a loading elevator for positioning a sample holder that holds a sample to be processed in the microwave plasma processing chamber;
• wherein the sample holder is provided with a metal ring with an inner wall thereof being slanted by 45 degrees for concentrating the plasma formed thereon.