Optical waveguide and method of manufacturing the same
AssigneeYasuo KOKUBUN and SEMICONDUCTOR PROCESS LABORATORY CO., LTD.
InventorsYasuo Kokubun, Yoshimi Shioya, Kazuo Maeda
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Abstract
The present invention relates to an optical waveguide constituting an optical integrated circuit and a method of manufacturing the same. In a method of manufacturing an optical waveguide having a core layer 22a, 22b, 23b and a cladding layer 23a, 24 for covering the core layer 22a, 22b, 23b, a silicon nitride film serving as the core layer 22a, 22b, 23b is formed by plasmanizing a gas mixture containing methylsilane and at least any one of nitrogen (N2) or ammonia (NH3) to react.
Claims24
A method of manufacturing an optical waveguide having a core layer and a cladding layer for covering the core layer,
- wherein a silicon nitride film serving as the core layer is formed by plasmanizing a gas mixture containing methylsilane and at least any one of nitrogen (N2) or ammonia (NH3) to react.
A method of manufacturing an optical waveguide having a core layer and a cladding layer for covering the core layer,
- wherein a silicon oxy-nitride film serving as the core layer or the cladding layer is formed by plasmanizing a gas mixture containing any one of methylsilane, alkyl compound having a siloxane bond, or alkyl compound having an alkoxy bond, dinitrogen monoxide (N2O), and at least any one of the nitrogen (N2) or the ammonia (NH3) to react.
A method of manufacturing an optical waveguide having a core layer and a cladding layer for covering the core layer,
- wherein a silicon oxide film serving as the cladding layer is formed by plasmanizing a gas mixture containing methylsilane and dinitrogen monoxide (N2O) to react.
Dependencies are inferred from the claim text.