Nanotip arrays
AssigneeAcademia Sinica
InventorsKuie-Hsien Chen, Jih Shang Hwang, Debajyoti Das, Hong Chun Lo, Li-Chyong Chen
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Abstract
Nanotip arrays are formed by exposing a substrate to a process gas mixture that simultaneously forms nanomasks on the substrate surface and etches exposed portions of the substrate surface to form the nanotip array. Components of the process gas mixture form nanocrystallites on the surface of the substrate, thereby masking portions of the substrate from other components of the process gas mixture, which etch exposed portions of the substrate. Accordingly, nanotip arrays formed using this technique can have nanocrytallite endpoints.
Claims83
A method for making a nanotip array, the method comprising:
- exposing a substrate to a plasma sufficient to form a mask material at the surface of the substrate, thereby forming masked portions of the substrate and unmasked portions of the substrate;
- and
- simultaneously etching the unmasked portions of the substrate to form a plurality of nanotips in the nanotip array.
A method for forming nanotip arrays, the method comprising:
- forming SiC crystallites at a surface of a substrate, thereby forming masked portions of the substrate and unmasked portions of the substrate;
- and
- etching unmasked portions of the substrate to form the nanotip array.
An article, comprising a nanotip array wherein nanotips in the nanotip array have endpoints comprising silicon carbide.
A nanotip comprising a first portion including a first material and a second portion including a second material, wherein the first material is SiC.
Dependencies are inferred from the claim text.