Microscale nozzle method for manufacturing the same
AssigneesGyros AB, Amic AB
InventorsPer Ove Ohman, Per Andersson
Life of this patent
Estimating the term…
Abstract
Method of manufacturing a microscale nozzle (52), comprising the steps of forming a microscale channel (32) in the top surface (34) of a substrate (30), said microscale channel (32) comprising an inlet end (36) and a nozzle-end (38), depositing a nozzle-forming layer (50) in a section of the microscale channel (32), removing material from the substrate (30) at the nozzle-end (38) of the microscale channel (32) to expose at least a portion of said nozzle-forming layer (50). The manufactured microscale nozzle may be used for transferring a liquid sample form a microchip fluidic system into an external analytical device. Whereby the transfer is performed by droplet, spray or steam.
Claims15
Method of manufacturing a microscale nozzle (52), characterized by the steps of:
- forming a microscale channel (32) in the top surface (34) of a substrate (30), said microscale channel (32) comprising an inlet end (36) and a nozzle-end (38),
- depositing a nozzle-forming layer (50) in a section of the microscale channel (32),
- removing material from the substrate (30) at the nozzle-end (38) of the microscale channel (32) to expose at least a portion of said nozzle-forming layer (50).
Method of manufacturing a microscale nozzle (52), characterized by the steps:
- injection-molding of a polymer-substrate (30) having a microscale channel (32) in the top surface (34) and a notch (60) in the bottom surface, said notch (60) being arranged such that it, from a topview, intersects the microscale channel (32) at a selected distance from the nozzle-end (38) towards the inlet end (36),
- depositing, on the top surface (34) of the substrate (30), a thin metal layer over the nozzle-forming section of the microscale channel (32), using a shade-mask, whereby the deposited metal layer will act as a seed-layer for electroplating,
- depositing a positive photoresist-layer on the top surface (34) of the substrate (30), said layer is made to fill the microscale channel (32) using a doctor-blade applying technique,
- soft baking of the substrate (30),
- exposing the substrate (30) without a mask, such that thin resist on the top surface (34) of the substrate (30) is fully exposed together with the resist covering the microscale channel (32), but the resist in the microscale channel (32) remains unexposed,
- developing the photoresist-layer, whereby the thin resist on the top surface (34) of the substrate (30) is removed, but the thick resist in the microscale channel (32) remains,
- removing parts of the metal seed-layer not covered by the photoresist,
- exposing the remaining photoresist through a shadow-mask defining the section of the microscale channel (32), where the nozzle-forming layer (50) is to be deposited,
- developing the photoresist, whereby the resist in exposed areas is removed,
- electroplating a 5-10 μm nozzle-forming metal layer (50) in the photoresist-free parts of the microscale channel 32,
- breaking the substrate (30) along the notch (60), exposing at least a portion of said nozzle-forming metal layer (50).
A microscale fluid handling system comprising a substrate (30) having at least one microscale channel (32) having an inlet end (36) and a nozzle-end (38), characterized in that a nozzle-forming layer (50) is deposited in one or more of said at least one microscale channel (32), and that a notch (60) is present in the bottom surface of the substrate (30), said notch (60) being arranged such that it, from a topview, intersects the microscale channel (32) at a selected distance from the nozzle-end (38) towards the inlet end (36).
Dependencies are inferred from the claim text.