Chemical amplification type positive resist composition
AssigneeSumitomo Chemical Company, Limited
InventorsMakoto Akita, Satoshi Yamaguchi
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Abstract
A chemical amplification type positive resist composition comprising: (A) a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and which contains a structural unit derived from p-hydroxystyrene and a structural unit represented by the formula (Ia) or (Ib) 1 wherein R1 and R2 each independently represents hydrogen or methyl, and R3 to R5 each independently represents alkyl having 1 to 8 carbon atoms; and (B) radiation-sensitive acid generator comprising sulfonic acid ester of N-hydroxyimide compound; and onium salt is provided.
Claims7
A chemical amplification type positive resist composition comprising:
- (A) a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and which contains a structural unit derived from p-hydroxystyrene and a structural unit represented by the formula (Ia) or (Ib)
- 11
- wherein R1 and R2 each independently represents hydrogen or methyl, and R3 to R5 each independently represents alkyl having 1 to 8 carbon atoms;
- and
- (B) radiation-sensitive acid generator comprising sulfonic acid ester of N-hydroxyimide compound;
- and onium salt.
Dependencies are inferred from the claim text.