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US 2004/0016894 A1Published application
Plasma generation
AssigneeIntel Corporation
InventorNeil Wester
Life of this patent
Estimating the term…
Abstract
A photolithography tool includes an anode and a cathode composed of a first material and a second material. The second material has a lower work function than the first material. Electrons emitted from the cathode ionize a gas into a plasma that generates EUV light. The EUV light is focused on a mask to produce an image of a circuit pattern. The image is projected on a semiconductor wafer to produce a circuit.
Claims44
An apparatus comprising:
- a first electrode that includes a first material and a second material bonded to the first material, the second material having a lower work function than the first material;
- and
- a second electrode, the first and second electrodes defining a passageway for gas, the first and second electrodes being electrically isolated.
An apparatus comprising:
- a passageway for gas;
- a first electrode;
- and
- a second electrode to emit electrons that ionize the gas into a plasma, the second electrode including a first material and a second material bonded to the first material, the second material having a lower work function than the first material.
1 more element
An apparatus comprising:
- a passageway for gas;
- a first electrode;
- and
- a second electrode to emit electrons that ionize the gas into a plasma that emits light, the second electrode having a surface work function lower than 2.66 eV.
1 more element
A photolithography tool, comprising:
- a chamber having an inlet to allow a gas to enter the chamber;
- a cathode disposed in the chamber, the cathode having a first material and a second material, the second material having a work function lower than the first material;
- an anode;
- a power supply to supply power to the cathode and the anode to cause the cathode to emit electrons that ionize the gas to form a plasma that emits light;
- a reflective mask having a pattern thereon;
- a light condenser to focus the light onto the mask;
- and
- a lens assembly to focus an image of the pattern onto a substrate.
5 more elements
A method comprising:
- passing a gas between a first electrode and a second electrode, the first electrode having a first material and a second material, the second material having a lower work function than the first material;
- and
- supplying electric power to the first and second electrodes to cause the first electrode to emit electrons to ionize the gas into a plasma.
A method comprising:
- generating a plasma by using an electrode to emit electrons that ionize a gas into the plasma, the electrode having a first material and a second material, the second material having a lower work function than the first material;
- generating light from the plasma;
- and
- using the light to form a pattern on a semiconductor substrate.
1 more element
A method comprising
- applying a coating of a first material to a second material to form a first electrode, the first material having a lower work function than the second material,
- assembling the first electrode with a second electrode to form a plasma generation device in which the electrodes are electrically isolated and a passage is defined through the first and second electrodes for gas that is to be ionized into a plasma.
Dependencies are inferred from the claim text.