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US 2004/0016508 A1Published application
Plasma etching apparatus and plasma etching method
OwnerToshio Masuda, Kazue Takahashi +3inventors
InventorsToshio Masuda, Kazue Takahashi, Mitsuru Suehiro, Tetsunori Kaji, Saburo Kanai
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Abstract
A plasma processing apparatus having a plasma generating unit, a process chamber capable of having an inside pressure thereof reduced, a process gas supply unit for supplying gas in the process chamber, a specimen table for holding a specimen, a vacuum pumping unit, and a monitor unit. The process chamber includes an outer cylinder having the capability of withstanding a reduced pressure, and an inner cylinder arranged inside the outer cylinder. The monitor unit enables monitoring of a temperature of the inner cylinder of the process chamber continuously or optionally at a time of processing a specimen.
Claims38
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- and
- a vacuum pumping unit;
- and
- a monitor unit;
- wherein said process chamber includes an outer cylinder having the capability of withstanding a reduced pressure, and an inner cylinder arranged inside said outer cylinder;
- and
- wherein said monitor unit enables monitoring of a temperature of said inner cylinder at least one of continuously and optionally at a time of processing of a specimen.
8 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- and
- a monitor unit;
- wherein said process chamber includes an outer cylinder having the capability of withstanding a reduced pressure and an inner cylinder arranged inside said outer cylinder;
- and
- wherein said monitor unit enables monitoring of a temperature of said inner cylinder continuously for every one of a plurality of specimens until processing of the plurality of specimens is completed when the plurality of specimens are processed one by one in a continuous manner.
7 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure reduced;
- a process gas supply unit for supplying gas to the process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- and
- a monitor unit;
- wherein said process chamber includes an outer cylinder having the capability of withstanding a reduced pressure and an inner cylinder arranged inside said outer cylinder;
- wherein said monitor unit enables monitoring of a temperature of said inner cylinder at a time of plasma processing for a specimen so that a history of the monitoring temperature up to an interruption of the plasma processing for the specimen is inputted and checked.
6 more elements
A plasma processing apparatus for plasma processing a specimen comprising:
- a plasma generating unit;
- a process chamber capable of having an inside thereof pressure reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding the specimen;
- a vacuum pumping unit;
- and
- a monitor unit;
- wherein said process chamber includes an outer cylinder having the capability of withstanding a reduced pressure, and an inner cylinder arranged inside said outer cylinder;
- wherein said monitor unit enables monitoring of a temperature of said inner cylinder during a seasoning operation when the seasoning operation is carried out in said process chamber.
6 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- and
- a monitor unit;
- wherein said process chamber includes an outer cylinder having the capability of withstanding a reduced pressure, and an inner cylinder arranged inside said outer cylinder;
- and
- wherein said monitor unit enables monitoring a temperature of said inner cylinder one of before starting plasma processing of a specimen and after finishing a cleaning operation of said plasma chamber.
7 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- a cleaning unit;
- and
- a monitor unit;
- wherein said process chamber includes an outer cylinder having the capability of withstanding a reduced pressure, and an inner cylinder arranged inside said outer cylinder;
- wherein said cleaning unit enables a cleaning operation of said process chamber under utilization of plasma for gas for cleaning at least one of before plasma processing of a specimen, during the plasma processing for a plurality of specimens and after the plasma processing of the specimen;
- and
- wherein said a monitor unit enables monitoring of a temperature of said inner cylinder after a cleaning operation and before starting the plasma processing for the specimen.
9 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- a monitor unit;
- and
- a plasma process interruption unit;
- wherein said process chamber includes an outer cylinder having the capability of withstanding a reduced pressure, and an inner cylinder arranged inside said outer cylinder;
- and
- wherein said monitor unit enables monitoring of a temperature of said inner cylinder;
- and
- wherein said plasma processing interruption unit enables interruption of plasma processing for the specimen in response to the monitoring of the temperature of said inner cylinder.
10 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- a cleaning unit;
- and
- a monitor unit;
- wherein said process chamber includes an outer cylinder having the capability of withstanding a reduced pressure, and an inner cylinder arranged inside said outer cylinder, and
- wherein said cleaning unit enables a cleaning operation of said process chamber under utilization of a plasma for gas for cleaning during processing of a plurality of specimens when the plural specimens are processed one by one in a continuous manner;
- and
- wherein said monitor unit enables monitoring of a temperature of said inner cylinder after the cleaning operation and before starting the plasma processing for the specimen.
9 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- and
- an alarm unit;
- wherein said process chamber includes an outer cylinder having the capability of withstanding a reduced pressure, and an inner cylinder arranged inside said outer cylinder;
- and
- wherein said alarm unit enables generation of an alarm in response to a detected monitoring temperature for said inner cylinder.
7 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- and
- a monitor unit;
- wherein said monitor unit enables monitoring of a temperature of an inner wall of said process chamber at least one of continuously and optionally at a time of processing a specimen.
5 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- and
- a monitor unit;
- wherein said monitor unit enables monitoring of a temperature of an inner wall of said process chamber continuously for every one of a plurality of specimens until the processing of plurality of specimen is completed when the plurality of specimen are processed one by one in a continuous manner.
5 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- and
- a monitor unit;
- wherein said monitor unit enables monitoring of a temperature of an inner wall of said process chamber at a time of plasma processing of the specimen so that a history in which the monitor temperature up to an interruption of the plasma processing for the specimen is inputted and checked.
5 more elements
A plasma processing apparatus for performing a plasma processing of a specimen by a plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- and
- a monitor unit;
- wherein said monitor unit enables monitoring of a temperature of an inner wall of said process chamber during a seasoning operation when the seasoning operation is performed in said process chamber.
5 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- and
- a monitor unit;
- wherein said monitor unit enables monitoring of a temperature of an inner wall of said process chamber one of before starting plasma processing of a specimen and after finishing a cleaning operation.
5 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- a cleaning unit;
- and
- a monitor unit;
- wherein said cleaning unit enables a cleaning operation of said process chamber under utilization of a plasma for gas for cleaning at least one of before plasma processing for a specimen, during the plasma processing for a plurality of specimens and after the plasma processing for the specimen;
- and
- wherein said monitor unit enables monitoring of a temperature of an inner wall of said process chamber after the cleaning operation and before starting the plasma processing for the specimen.
8 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- a monitor unit;
- and
- a plasma processing interruption unit;
- wherein said monitor unit enables monitoring of a temperature of an inner wall of said process chamber;
- and
- wherein said plasma processing interruption unit enables interruption of plasma processing for the specimen in response to the monitored inner wall temperature.
8 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- a cleaning unit;
- and
- a monitor unit;
- wherein said cleaning unit enables a cleaning operation of said process chamber under utilization of plasma of gas for cleaning during processing of a plurality of specimens when the plurality of specimens are processed one by one in a continuous manner;
- and
- wherein said monitor unit enables monitoring of a temperature of an inner wall of said process chamber after the cleaning operation and before starting the plasma processing for the specimen.
8 more elements
A plasma processing apparatus comprising:
- a plasma generating unit;
- a process chamber capable of having an inside pressure thereof reduced;
- a process gas supply unit for supplying gas to said process chamber;
- a specimen table for holding a specimen;
- a vacuum pumping unit;
- and
- an alarm unit;
- wherein said alarm unit enables generation of an alarm in response to a detected monitoring temperature at an inner wall of said process chamber.
5 more elements
Dependencies are inferred from the claim text.