Atomic force microscopy measurements of contact resistance and current-dependent stiction
AssigneeFidelica Microsystems, Inc.
InventorShiva Prakash
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Abstract
A modified atomic force microscope (AFM) is used to perform contact resistance and/or current-dependent stiction measurements for conductive thin films at controlled values of applied force. The measurements are preferably performed under conditions approximating the operation of the thin films as electrodes in microswitch array fingerprint sensors. A first, planar thin film is contacted with a second, curved thin film deposited over a round ball having a diameter of a few microns to a few tens of microns. The second film is preferably a coating deposited over the ball and over the arm controlling the ball motion. The coating deposited over the arm provides an electrically conductive path to the contact surface of the ball.
Claims5
A method of testing a pair of thin films, each thin film being formed by a material desired for use as a different one of a pair of contact materials, to obtain information that is usable in a determination whether at least one of the pair of contact materials is appropriate for use as a contact material in a switch, comprising:
- performing at least one atomic force microscopy measurement relating to a predetermined characteristic of the pair of contact materials on the pair of thin films after they contact each other with a first controlled force.
Dependencies are inferred from the claim text.