Atomic force microscopy measurements of contact resistance and current-dependent stiction
AssigneeFidelica Microsystems, Inc.
InventorShiva Prakash
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Abstract
A modified atomic force microscope (AFM) is used to perform contact resistance and/or current-dependent stiction measurements for conductive thin films at controlled values of applied force. The measurements are preferably performed under conditions approximating the operation of the thin films as electrodes in microswitch array fingerprint sensors. A first, planar thin film is contacted with a second, curved thin film deposited over a round ball having a diameter of a few microns to a few tens of microns. The second film is preferably a coating deposited over the ball and over the arm controlling the ball motion. The coating deposited over the arm provides an electrically conductive path to the contact surface of the ball.
Claims7
A method of testing, comprising:
- disposing a first film of a first contact material on a substrate;
- disposing a second film of a second contact material on a rounded piece;
- performing a measurement of a contact resistance value between the first film and the second film while the first film and the second film contact with a first controlled force;
- running a current through a contact interface between the first film and the second film while the first film and the second film contact with a second controlled force;
- and
- after running the current, performing a measurement of a stiction force value between the first film and the second film.
Dependencies are inferred from the claim text.