Silicon-containing polymer, resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsTakanobu Takeda, Jun Hatakeyama, Toshinobu Ishihara
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Abstract
Silicon-containing polymers comprising recurring units of three components represented by the general formula (1) are novel wherein R1, R2 and R3 are hydrogen or C1-10 alkyl, R4, R5 and R6 are hydrogen, C1-20 alkyl or haloalkyl, or C6-20 aryl, R7 is C4-20 alkyl, n is 1 to 5, p, q and r are positive numbers. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of less than 300 nm and improved resistance to oxygen plasma etching. 1
Claims10
A silicon-containing polymer comprising recurring units of three components represented by the general formula (1):
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- wherein R1, R2 and R3 are each independently hydrogen or a straight, branched or cyclic alkyl group of 1 to 10 carbon atoms,
- R4, R5 and R6 are each independently hydrogen, an alkyl or haloalkyl group of 1 to 20 carbon atoms, or aryl group of 6 to 20 carbon atoms,
- R7 is a straight, branched or cyclic alkyl group of 4 to 20 carbon atoms,
- n is a number of 1 to 5, p, q and r are positive numbers.
A silicon-containing polymer comprising recurring units of three components represented by the general formula (2):
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- wherein R1, R2 and R3 are each independently hydrogen or a straight, branched or cyclic alkyl group of 1 to 10 carbon atoms,
- R8 to R12 are each independently hydrogen, an alkyl or haloalkyl group of 1 to 20 carbon atoms, an aryl group of 6 to 20 carbon atoms or a silicon-containing group which forms a siloxane or silalkylene linkage to the silicon atom in the formula,
- R7 is a straight, branched or cyclic alkyl group of 4 to 20 carbon atoms,
- p, q and r are positive numbers.
Dependencies are inferred from the claim text.