Structure for preventing salicide bridging and method thereof
AssigneeMacronix International Co., Ltd.
InventorsTsai-Fu Chang, Shih Lin Chu, Ching Pen Yeh
Life of this patent
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Abstract
A semiconductor device having a memory array that includes a plurality of substantially parallel word lines, a plurality of substantially parallel bit lines, wherein each of the plurality of the word lines is substantially perpendicular to each of the plurality of the bit lines, a first dummy word line disposed at a periphery of the memory array, wherein the first dummy word line is substantially parallel to the plurality of word lines and overlaps at least two non-adjacent bit lines.
Claims12
A semiconductor device having a memory array, comprising:
- a plurality of substantially parallel word lines;
- a plurality of substantially parallel bit lines, wherein each of the plurality of the word lines is substantially perpendicular to each of the plurality of the bit lines;
- a first dummy word line disposed at a periphery of the memory array, wherein the first dummy word line is substantially parallel to the plurality of word lines and overlaps at least two non-adjacent bit lines.
A semiconductor device, comprising:
- a memory array comprising a plurality of transistors;
- and
- a plurality of non-memory transistors,
- wherein the memory array includes
- a plurality of substantially parallel word lines,
- a plurality of substantially parallel bit lines, each of the plurality of the word lines being substantially perpendicular to each of the plurality of the bit lines, and
- a first dummy word line disposed at a periphery of the memory array, wherein the first dummy word line is substantially parallel to the plurality of word lines and overlaps at least one of the plurality of bit lines.
A method for manufacturing a semiconductor device, comprising:
- forming a plurality of substantially parallel bit lines;
- forming a plurality of substantially parallel word lines, wherein each of the plurality of the word lines is substantially perpendicular to each of the plurality of the bit lines;
- depositing a layer of tetraethyl orthosilicate over the plurality of bit lines and plurality of word lines, wherein the amount of tetraethyl orthosilicate deposited on top of the plurality of word line having a thickness greater than half the distance separating adjacent word lines;
- and
- etching back the tetraethyl orthosilicate layer.
Dependencies are inferred from the claim text.