Doping method, doping apparatus, and control system for doping apparatus

A doping method in which a plurality of ion species that contain one conductive type impurity element and a specific ion are simultaneously injected into a target material, comprising the steps of:

• measuring an ion current of the specific ion;
• comparing the ion current of the specific ion and a converting data associating a concentration of the one conductive type impurity element in the target material and the ion current of the specific ion;
• and
• controlling a dose amount of the one conductive type impurity element to be injected into the target.

A doping apparatus comprising:

• a doping processing system having a means for discharging an ion beam constructed of a plurality of ions including one conductive type impurity element;
• an ion detecting means having a mass separator for measuring an ion current value of a specific ion having the maximum abundance ratio among the plurality of the ion species;
• a memory means for memorizing a converting data associating a concentration of the one conductive type impurity element in the target material and the ion current value of the specific ion;
• and
• a control means for calculating an actual dose amount of the one conductive type impurity element based on the ion current value of the specific ion and the converting data, and controlling the doping processing system.

A doping apparatus comprising:

• a doping processing system having a means for discharging an ion beam constructed of a plurality of ions including one conductive type impurity element and a specific ion;
• an ion detecting means having a mass separator for measuring an ion current value of the ion beam;
• a memory means for memorizing a converting associating a concentration of the one conductive type impurity element in the target material and the ion current value of the ion beam;
• and
• a control means for calculating an actual dose amount of the one conductive type impurity element based on the ion current value of the ion beam and the converting data, and controlling the doping processing system.

A doping apparatus comprising:

• a doping processing system having a means for discharging an ion beam constructed of a plurality of ions including one conductive type impurity element;
• an ion detecting means having a mass separator for measuring an ion current value of a specific ion having the maximum abundance ratio among the plurality of the ion species;
• and
• a control means for calculating an actual dose amount of the one conductive type impurity element based on the ion current value of the specific ion, and controlling the doping processing system.