Method for making layout data in semiconductor integrated circuit
AssigneeNEC Compound Semiconductor Devices, Ltd.
InventorKyou Suzuki
Life of this patent
Estimating the term…
Abstract
Circuit diagram data having repeated patterns is divided by the process of group dividing into main patterns and replicated patterns, relations of each of the patterns are held as group composition information, replicated pattern layout data corresponding to replicated patterns is made by copying the main pattern layout data corresponding to the main patterns made by a net driven layout editor, and the process of offset arrangement which involves shifting the coordinates of the replicated pattern layout data is performed, thereby making it possible to arrange the replicated pattern layout data on the same hierarchical level as the main pattern layout data and to make layout data with the flat circuit diagram data kept as it is.
Claims13
A method for making layout data in a semiconductor integrated circuit, comprising:
- group dividing process for dividing circuit diagram data having repeated patterns into main patterns and replicated patterns and for outputting relations of each of the main patterns and the replicated patterns as group composition information formed by connection information of the constituent components, search information of the constituent components, component coincidence information of the constituent components and arrangement information of the constituent components for each of the constituent components included in the circuit diagram data;
- identification process for identifying the main patterns, the replicated patterns and others from the group composition information;
- main pattern layout data making process for making main pattern layout data made by use of a net driven layout editor corresponding to main patterns in a case where the group composition information is the main patterns;
- and
- replicated pattern layout data making process for making replicated pattern layout data corresponding the replicated patterns by copying the main pattern layout data corresponding to the main patterns made by the net driven layout editor in a case where the group composition information is the replicated patterns.
Dependencies are inferred from the claim text.