Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same

A material for an insulating film which comprises, as a component forming the film, a copolymer obtained by reacting a polyamide represented by following general formula [1] with a reactive oligomer having a substituent which can react with carboxyl group, amino group or hydroxyl group in a structure of the polyamide;

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• wherein R1 to R4 each independently represent hydrogen atom or a monovalent organic group, X represents a tetravalent group selected from groups represented by following formulae (A), two groups represented by X may be the same with or different from each other, Y represents at least one divalent group selected from groups represented by following formulae (B), (C), (D) and (E), Z represents a divalent group selected from groups represented by following formulae (F), m and n each represent an integer satisfying relations of m>0, n≧0, 2≦m+n≦1,000 and 0.05≦m/(m+n)≦1 and arrangement of repeating units may be a block arrangement or a random arrangement;
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• wherein X1 in formulae (A) and (F) represents a divalent group selected from groups represented by following formulae (G):
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• R in formulae (C) represents an alkyl group or a monovalent group selected from groups represented by formulae (I):
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• and hydrogen atoms on a benzene ring in groups represented by Formulae (A), (B), (C), (D), (E), (F) and (G) may be substituted with at least one atom or group selected from alkyl groups having 1 to 4 carbon atom, fluorine atom and trifluoromethyl group.