Methods and systems for fabricating nanopores for single-electron devices and single-electron devices including nanopores

A single-electron device comprising:

• a substrate;
• a plurality of spaced apart electrode regions and a spacer region therebetween, on the substrate;
• a cover layer on the spaced apart electrode regions and on the spacer region, the cover layer containing therein a nanopore adjacent the spacer region that is less than about 20 nm wide and less than about 20nm deep;
• and
• at least one nanoparticle in the nanopore.

A system for fabricating a single-electron device comprising:

• a substrate holder that is configured to hold a substrate that includes a plurality of spaced apart electrode regions, a spacer region therebetween, and a cover layer on the spaced apart electrode regions and on the spacer region;
• a wet etching solution container that is configured to contact a wet etching solution to the cover layer;
• and
• a controller that is configured to energize at least one of the spaced apart electrode regions to selectively wet etch the cover layer adjacent the spacer region and define a nanopore in the cover layer adjacent the spacer region.

An intermediate product single-electron device comprising:

• a substrate;
• a plurality of spaced apart electrode regions and a spacer region therebetween, on the substrate;
• a cover layer on the spaced apart electrode regions and on the spacer region, the cover layer containing therein a nanopore adjacent the spacer region that is less than about 20 nm wide and less than about 20 nm deep;
• and
• a wet etching solution that contacts the cover layer including the nanopore.