Polymers with mixed photoacid-labile groups and photoresists comprising same
AssigneeShipley Company, L.L.C.
InventorsTimothy G. Adams, Matthew A. King
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Abstract
The invention provides novel polymers and photoresist compositions that comprise the polymers as a resin component. Polymers of the invention contain two distinct groups which can undergo a deblocking reaction in the presence of photogenerated acid, wherein one of the deblocking moieties is an acetal group. The second photoacid-labile group is suitably an ester, particularly as provided by polymerization of an alkyl acrylate group, such as t-butylmethacrylate.
Claims37
A photoresist composition comprising a photoactive component and a polymer that comprises i) a photoacid-labile acetal unit;
- and ii) a photoacid-labile unit that is distinct from unit i).
A photoresist composition that comprises a photoactive component and a polymer component that comprises at least two distinct photoacid-labile groups.
A polymer that comprises i) a photoacid-labile acetal unit;
- and ii) a photoacid-labile unit that is distinct from unit i).
Dependencies are inferred from the claim text.