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AssigneeBattelle Memorial Insitute
InventorsKentin L. Alford, Kevin L. Simmons, William D. Samuels, Thomas S. Zemanian, Jun Liu, Yongsoon Shin, Glen E. Fryxell
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The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.
A method of forming a monolayer of functionalized silicon on a substrate surface, the functionalized silicon including an organic group covalently attached with the silicon, the method comprising exposing the substrate surface to a precursor comprising the functionalized silicon under a pressure of at least 30 psi, the precursor interacting with the substrate to form the monolayer across at least a portion of the surface of the substrate.
A method of functionalizing a porous material, comprising exposing the porous material to precursor molecules, the precursor molecules comprising core atoms from which crosslinking atoms and functional groups extend;
A method of functionalizing an oxygen-containing surface, comprising exposing the surface to precursor molecules, the precursor molecules comprising core atoms from which crosslinking atoms and functional groups extend;
A method of functionalizing a carbon-containing surface, comprising exposing the surface to precursor molecules, the precursor molecules comprising core atoms from which crosslinking atoms and functional groups extend;
Dependencies are inferred from the claim text.