Substrate cleaning method and substrate cleaning apparatus
AssigneeKabushiki Kaisha Toshiba
InventorsKenji Masui, Akio Kosaka, Hidehiro Watanabe
Life of this patent
Estimating the term…
Abstract
A to-be-cleaned substrate is cleaned by use of an acid liquid agent in a cleaning cup, the remaining acid liquid agent is washed out by use of pure water, then an alkaline liquid agent is emitted to the surface of the to-be-cleaned substrate in the same cleaning cup to remove the acid liquid agent remaining on the to-be-cleaned substrate. A neutralization reaction between the acid and alkali is caused by emitting the alkaline liquid agent to the surface of the to-be-cleaned substrate so as to efficiently remove the acid liquid agent remaining on the surface of the to-be-cleaned substrate.
Claims21
A substrate cleaning method comprising:
- cleaning a to-be-cleaned substrate disposed in a cleaning cup by use of an acid liquid agent;
- and
- cleaning the substrate by use of an alkaline liquid agent in the cleaning cup to neutralize residue of the acid liquid agent after the step of cleaning by use of the acid liquid agent.
A substrate cleaning method comprising:
- oxidizing impurities on a surface of a to-be-cleaned substrate by use of an oxidizing agent;
- and
- cleaning the to-be-cleaned substrate by use of a reducing agent to remove the oxidized impurities after the oxidizing step.
A substrate cleaning apparatus comprising:
- a cleaning cup configured to receive a to-be-cleaned substrate;
- a table disposed in the cleaning cup, configured to support the to-be-cleaned substrate;
- a first nozzle disposed in the cleaning cup, configured to supply an acid liquid agent;
- a second nozzle disposed in the cleaning cup, configured to supply an alkaline liquid agent;
- a third nozzle disposed in the cleaning cup, configured to supply hot pure water;
- a pure water heating mechanism configured to supply the hot pure water;
- a branch line formed in an intermediate portion of a pipe extending from the pure water heating mechanism to the third nozzle configured to supply the hot pure water to lower water pressure in the pipe;
- and
- a control mechanism configured to control operations of the first to the third nozzle and the pure water heating mechanism.
Dependencies are inferred from the claim text.