Method for producing a mask set for lithography including at least one mask and methods for imaging structures of a predetermined layout into a common exposure plane
AssigneeInfineon Technolgies AG
InventorsMolela Moukara, Reinhard Pufall
Life of this patent
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Abstract
A method for producing a mask set for lithography including at least one mask, has a predetermined layout of structures which are provided for imaging into a common exposure plane and which are transferred to the masks as a basis. Strongly coupled structures that are so closely adjacent one another, at least in sections, that they are strongly coupled in the case of simultaneous imaging are distributed between at least two different masks of the mask set.
Claims27
A method for producing a mask set for lithography including a mask, which comprises:
- using, as a basis, a predetermined layout of structures to be imaged into a common exposure plane and transferred to the mask;
- and
- transferring the structures depending on a coupling of the structures to prevent strongly coupled structures from being present on the mask.
A method for imaging structures of a predetermined layout into a common exposure plane, which comprises:
- providing a mask set including a phase mask, the mask being imageable by a given radiation;
- applying structures onto the mask, the structures all having a given phase and being one of coupled and not coupled to one another;
- and
- applying auxiliary structures assigned to the structures onto the mask, the auxiliary structures not being imageable by the given radiation and having a phase opposite the given phase of the structures.
A method for imaging structures of a predetermined layout into a common exposure plane, which comprises:
- providing a mask set including at least two masks;
- and
- applying structures onto the masks, the structures on any given one of the masks being one of weakly coupled and not coupled to one another.
Dependencies are inferred from the claim text.