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US 2003/0228528 A1Published application
Photomask blank manufacturing method
AssigneeHoya Corporation
InventorsMasaru Mitsui, Toshiyuki Suzuki, Shigenori Ishihara
Life of this patent
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Abstract
A method of manufacturing a photomask blank having at least a film for forming a mask pattern on a transparent substrate comprises the steps of causing a sputtering atmosphere to contain at least a helium gas to form a film for forming the mask pattern by sputtering, and heating the transparent substrate during or after the film forming step.
Claims8
A method of manufacturing a photomask blank having at least a film for forming a mask pattern on a transparent substrate, comprising the steps of:
- causing a sputtering atmosphere to contain at least a helium gas to form at least one layer of the film for forming the mask pattern by sputtering;
- and
- heating the transparent substrate during or after the film forming step.
Dependencies are inferred from the claim text.