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US 2003/0228490 A1Published application
Self-annealed thin film deposition process
AssigneeSeagate Technology LLC
InventorJai-Young Kim
Life of this patent
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Abstract
A method of manufacturing a thin film of magnetic material, comprises sputtering magnetic material from a target to a substrate to form a thin film of the magnetic material on the substrate, wherein the ratio of sputtering power in Watt to sputtering pressure in mTorr is greater than one. Thin films of magnetic material made according to the method and magnetic storage media including a thin film of magnetic material made according to the method are also included.
Claims20
A method of manufacturing a thin film of magnetic material, the method comprising:
- sputtering magnetic material from a target to a substrate to form a thin film of the magnetic material on the substrate, wherein the ratio of sputtering power in Watt to sputtering pressure in mTorr is greater than one.
A thin film of magnetic material comprising:
- a plurality of face centered tetragonal particles produced by thermalizing face centered cubic particles in a plasma during a plasma deposition process.
Dependencies are inferred from the claim text.