Simultaneous discharge apparatus

Abstract

There is provided a simultaneous discharge apparatus comprising a plurality of plasma treatment apparatuses and a single high-frequency power supply, in which the plurality of plasma treatment apparatuses are discharged simultaneously using the single high-frequency power supply, the plurality of plasma treatment apparatuses being a plasma treatment apparatus in which a coil electrode is used as an electrode for generating plasma and inductive coupled plasma is mainly generated, wherein a power supply line from the high-frequency power supply is branched into each plasma treatment apparatus through a branch section, and a fixed capacitor is provided on the downstream side of the branch section and between the branch section and each plasma treatment apparatus. It is preferable to adjust the impedance of the fixed capacitor to be 2.3-2.7 times that of the coil electrode which is located on the same downstream side. With this, it is possible to conduct a treatment such as an etching process or an ashing process to a coating film formed on the surface of a material to be treated in each chamber at the same rate.

Dependencies are inferred from the claim text.