Processes for producing polysiloxanes and photoresist compositions comprising same
AssigneeShipley Company, L.L.C.
InventorsGeorge G. Barclay, Subareddy Kanagasabapathy, Matthew A. King
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Abstract
New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.
Claims89
A method for preparing a photoresist composition, comprising:
- a) polymerizing one or more reactive silane compound in the presence of compound having multiple reactive nitrogen moieties to provide a siloxane polymer;
- and
- b) admixing the polymer with a photoactive component.
A photoresist composition comprising a photoactive component and a siloxane polymer obtainable by polymerizing one or more reactive silane compound in the presence of compound having multiple reactive nitrogen moieties to provide the siloxane polymer.
A for preparation of a photoresist composition comprising:
- providing a siloxane polymer obtainable by polymerizing one or more reactive silane compound in the presence of compound having multiple reactive nitrogen moieties to provide the siloxane polymer;
- and
- admixing the polymer with a photoactive component.
A method for producing a siloxane polymer comprising polymerizing one or more reactive silane compound in the presence of compound having multiple reactive nitrogen moieties to provide the siloxane polymer.
Dependencies are inferred from the claim text.