Projection exposure device and position alignment device and position alignment method

A position adjustment device in a projection exposure device including a photo mask depicted with a pattern of a circuit, etc., a stage for supporting an exposure object onto which the pattern of the photo mask is exposed, a position adjustment device for adjusting the positional relationship of a photo mask and said exposure object by moving either or both of the photo mask and the stage, an optical projection system for exposing the pattern of the photo mask by an exposure wavelength onto said exposure object capable in a reduced or enlarged form, a mask mark set up on said photo mask and used for position adjustment, an object mark set up on said exposure object and used for position adjustment, comprising:

• a mask mark light source for irradiating said mask mark by rays of the same wave length as said exposure wavelength;
• an object mark light source for irradiating said object mark by rays of a second wavelength which is different from the exposure wavelength;
• an exposure wavelength reflector installed in between said optical projection system and said exposure object for reflecting rays of the same wavelength as said exposure wavelength while transmitting rays of the second wavelength which is different from said exposure wavelength;
• a mask mark photography device for photographing said mask mark by the rays reflected by the exposure wavelength reflector;
• an object mark photography device for photographing the object mark irradiated by rays of said second wavelength transmitted through said exposure wavelength reflector;
• and
• a control device for aligning said photo mask with the exposure object by controlling said position adjustment device in reference to said photographed mask mark and object mark.