Electrode for thin film capacitor devices
AssigneeRaytheon Company
InventorsJohn J. Drab, Thomas K. Dougherty, Kathleen A. Kehle
Life of this patent
Estimating the term…
Abstract
A method of forming a conductor on a substrate including steps of depositing tantalum on a glass layer of the substrate; oxidizing the tantalum; and depositing a noble metal on the oxidized tantalum to form the conductor. The method can be used to form a ferroelectric capacitor or other thin film ferroelectric device. The device can include a substrate comprising a glass layer; and an electrode connected to the glass layer. The electrode comprising can include a noble metal connected to the glass layer by an adhesion layer comprising Ta2O5.
Claims37
A method of forming a conductor on a substrate comprising steps of:
- depositing tantalum on a glass layer of the substrate;
- oxidizing the tantalum;
- and
- depositing a noble metal on the oxidized tantalum to form the conductor.
A method of forming a platinum electrode on a silicon oxide substrate comprising steps of:
- forming an adhesion layer comprising oxidized tantalum, the adhesion layer being located on the silicon oxide;
- and
- connecting the platinum to the adhesion layer by heated deposition.
A thin film ferroelectric device comprising:
- a substrate comprising a glass layer;
- and
- an electrode connected to the glass layer, the electrode comprising a noble metal connected to the glass layer by an adhesion layer comprising Ta2O5.
An electrode for a thin film capacitor device comprising:
- a metal oxide adhesion layer;
- and
- a noble metal conductor connected on the metal oxide adhesion layer.
A method of forming an electrode for a thin film capacitive device comprising steps of:
- deposition of a metal oxide adhesion layer on a top layer of a glass substrate;
- and
- deposition of a noble metal conductor on the metal oxide adhesion layer.
A thin film ferroelectric capacitor comprising:
- a substrate;
- a metal oxide adhesion layer on the substrate;
- a noble metal conductor on the metal oxide adhesion layer
- a ferroelectric thin film on the noble metal conductor;
- and
- a noble metal conductor on the ferroelectric thin film.
Dependencies are inferred from the claim text.