Chemical vapor deposition apparatus and deposition method

A chemical vapor deposition apparatus comprising:

• a chamber defined at least in part by chamber walls;
• a chamber liner apparatus forming a deposition subchamber within the chamber;
• a substrate holder within the deposition subchamber;
• the chamber liner apparatus comprising a subchamber surface having a plurality of purge gas inlets to the subchamber therein;
• and
• a purge gas inlet passageway in fluid communication with the purge gas inlets.

A chemical vapor deposition apparatus comprising:

• a deposition chamber defined at least in part by chamber walls;
• a substrate holder within the chamber, the substrate holder comprising support structure, the support structure comprising a surface exposed to the chamber, the surface comprising a plurality of purge gas inlets to the chamber therein;
• and
• a purge gas inlet passageway in fluid communication with the purge gas inlets.

A deposition method comprising:

• positioning a substrate within a deposition chamber defined at least in part by chamber walls, at least one of the chamber walls comprising a chamber surface having a plurality of purge gas inlets to the chamber therein;
• providing a process gas over the substrate effective to deposit material onto the substrate;
• and
• during the providing, emitting purge gas to the deposition chamber from the purge gas inlets effective to form an inert gas curtain over the chamber surface.

A deposition method comprising:

• positioning a substrate within a deposition chamber defined at least in part by chamber walls, the deposition chamber comprising a component received therein internally of the chamber walls, the component comprising a surface exposed to the chamber, the surface comprising a plurality of purge gas inlets to the chamber therein;
• providing a process gas over the substrate effective to deposit material onto the substrate;
• and
• during the providing, emitting purge gas to the deposition chamber from the purge gas inlets effective to form an inert gas curtain over the component surface within the deposition chamber.