Method of forming holographic grating
AssigneeShimadzu Corporation
InventorsMasaru Koeda, Yuji Tanaka, Akio Soejima
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Abstract
In a method of forming a holographic grating, a photoresist layer is formed on an optical substrate, and a resist pattern is formed in the photoresist layer to have grooves depth deeper than a predetermined depth of diffraction grating grooves to be formed. Then, the photoresist layer with the resist pattern is etched by an ion beam generated by a mixed gas containing a fluorine based gas and oxygen until the resist pattern is substantially completely disappears. Thus, the diffraction grating grooves having the predetermined depth are directly engraved on the optical glass plate.
Claims7
A method of forming a holographic grating, comprising:
- providing a photoresist layer on an optical substrate,
- forming a resist pattern in the photoresist layer to have grooves depth deeper than a predetermined depth of diffraction grating grooves to be formed, and
- etching the photoresist layer with the resist pattern by an ion beam generated by a mixed gas containing a fluorine based gas and oxygen until the resist pattern is substantially completely disappears so that the diffraction grating grooves having the predetermined depth are directly engraved on the optical glass plate.
Dependencies are inferred from the claim text.