Composition and process for treating metal surfaces and resulting article

A metal surface treatment liquid composition that comprises water and the following components:

• (A) a component of resin molecules that conform to general formula (I):
• 5
• wherein:
• n represents 0 or an integer from 1 through 29;
• m represents 0 or an integer from 1 through 10;
• W represents a moiety selected from the group consisting of:
• (1) a hydrogen atom moiety;
• and
• (2) moieties conforming to one of the general formulas —CH2X, —CH2NHCH2X, and —CH═NCH2X, in all of which “X” represents a moiety selected from the group consisting of:
• —OH;
• moieties conforming to —OR4, wherein R4 is selected from the group consisting of alkyl moieties having from 1 to 5 carbon atoms and hydroxyalkyl moieties having from 1 to 5 carbon atoms;
• covalently bonded halogen atom moieties;
• and
• moities conforming to one of general formula (III) or general formula (IV):
• 6
• wherein:
• each of R5, R6, R7, R8, and R9 independently represents a moiety selected from the group consisting of:
• hydrogen atom moieties;
• alkyl moieties having from 1 to 10 carbon atoms;
• and
• hydroxyalkyl moieties having from 1 to 10 carbon atoms;
• and
• A− represents a hydroxyl ion or an anion of an acid;
• each “W” symbol in general formula (I) is independently selected, subject to constraints that:
• a positive number of the selections for “W” are not hydrogen atom moieties;
• and
• said positive number of the selections for “W” that are not hydrogen atom moieties has a ratio to the number n+m+1, this ratio being denoted hereinafter as the “P-ratio”, that is from 0.2:1.00 to 4.0:1.00;
• R1, independently for each of the n+m units shown between a pair of square brackets in formula (I), represents a moiety selected from the group consisting of —CH2—, —CH2—NH—CH2—, and —CH═N—CH2—;
• Y, independently for each of the n+1 instances of the symbol in the general formula, represents a hydrogen moiety or a moiety that conforms to general formula (II):
• 7
• wherein each of R2 and R3 independently represents a hydrogen atom or an alkyl group with not more than 3 carbon atoms and W, independently for each instance of its occurrence in formula (II), is selected from the group consisting of:
• (1) a hydrogen atom moiety;
• and
• (2) moieties conforming to one of the general formulas —CH2X, —CH2NHCH2X, and —CH═NCH2X, in all of which “X” represents a moiety selected from the group consisting of:
• —OH;
• moieties conforming to —OR4, wherein R4 is selected from the group consisting of alkyl moieties having from 1 to 5 carbon atoms and hydroxyalkyl moieties having from 1 to 5 carbon atoms;
• covalently bonded halogen atom moieties;
• and
• moities conforming to one of general formula (III) or general formula (IV):
• 8
• wherein:
• each of R5, R6, R7, R8, and R9 independently represents a moiety selected from the group consisting of:
• hydrogen atom moieties;
• alkyl moieties having from 1 to 10 carbon atoms;
• and
• hydroxyalkyl moieties having from 1 to 10 carbon atoms;
• and
• A− represents a hydroxyl ion or an anion of an acid;
• Z is selected from the group consisting of
• (1) divalent moieties which:
• can be formed by the loss, from an organic compound that is capable of addition condensation with formaldehyde and that contains at least one 5- or 6-membered ring that includes two conjugated double bonds, of two hydrogen atoms, each originally bonded to a carbon atom that was part of said 5- or 6-membered ring;
• and
• differ from the aromatic-ring-containing moiety in the part of formula (I) between the square brackets subscripted by “n”;
• and
• (2) divalent moieties that can be formed by the loss of one hydrogen atom from each of two distinct amino moieties of melamine, guanamine, and urea;
• and
• (B) a component selected from the group consisting of vanadium compounds in which the valence of the vanadium atoms is 5, 4, or 3;
• and
• (C) a component selected from the group consisting of compounds that contain at least one metal selected from the group consisting of zirconium, titanium, molybdenum, tungsten, manganese, and cerium.