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US 2003/0211403 A1Published application
Photomask for nearfield exposure, method for making pattern using the photomask, and apparatus for making pattern including the photomask
AssigneeCanon Kabushiki Kaisha
InventorsNatsuhiko Mizutani, Yasuhisa Inao
Life of this patent
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Abstract
A photomask for near-field light exposure includes a transparent substrate, and a shading member on the substrate, the shading member having a mask pattern including an aperture with a width not greater than the wavelength of light from a light source. The shading member has a thickness that provides a required light intensity right below the aperture in consideration of a relationship with the width of the aperture.
Claims13
A photomask for near-field light exposure comprising:
- a transparent substrate;
- and
- a shading member on the substrate, the shading member having a mask pattern including an aperture with a width not greater than the wavelength of light from a light source;
- wherein the shading member has a thickness that provides a required light intensity right below the aperture in consideration of a relationship with the width of the aperture.
1 more element
Dependencies are inferred from the claim text.