Method for selective chemical vapor deposition of nanotubes
AssigneeMotorola, Inc.
InventorsRuth Yu-ai Zhang, Raymond K. Tsui, John Tresek JR., Adam M. Rawlett
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Abstract
A method of fabricating a nanotube structure which includes providing a substrate, providing a mask region positioned on the substrate, patterning and etching through the mask region to form at least one trench, depositing a conductive material layer within the at least one trench, depositing a solvent based nanoparticle catalyst onto the conductive material layer within the at least one trench, removing the mask region and subsequent layers grown thereon using a lift-off process, and forming at least one nanotube electrically connected to the conductive material layer using chemical vapor deposition with a methane precursor.
Claims26
A method of fabricating nanotube structures comprising the steps of:
- providing a substrate with a surface;
- providing a mask region positioned on the surface of the substrate;
- patterning and etching through the mask region to form at least one trench;
- depositing a conductive material layer on the surface of the substrate and within the at least one trench;
- depositing a nanoparticle catalyst suspended in a solvent onto the conductive material layer and within the at least one trench;
- removing the mask region and subsequent layers deposited thereon;
- and
- forming at least one nanotube electrically connected to the conductive material layer using a reaction chamber.
A method of fabricating nanotube structures comprising the steps of:
- providing a substrate with a surface;
- providing a first photoresist layer positioned on the surface of the substrate;
- providing a second photoresist layer positioned on the first photoresist layer;
- patterning and etching through the first and the second photoresist layers to form a first trench and a second trench wherein the first trench is spaced apart from the second trench by the first photoresist layer and the second photoresist layer;
- depositing a first conductive material layer on the surface of the substrate within the first trench and depositing a second conductive material layer on the surface of the substrate within the second trench;
- depositing a nanoparticle catalyst suspended in water onto at least one of the first conductive material layer and the second conductive material layer;
- removing the first photoresist layer and the second photoresist layer and subsequent layers deposited thereon;
- forming at least one nanotube with a first end and a second end using a reaction chamber;
- and
- wherein the first end of the at least one nanotube is connected to the first conductive material layer and the second end of the at least one nanotube is connected to the second conductive material layer.
A method of fabricating nanotube structures comprising the steps of:
- providing a substrate;
- providing at least one electronic circuit positioned on the substrate;
- providing a mask region positioned on the substrate and the at least one electronic circuit;
- patterning and etching through the mask region;
- depositing a nanoparticle catalyst which includes a solvent onto the at least one electronic circuit;
- removing the mask region;
- forming at least one nanotube with a first end and a second end using a reaction chamber;
- and
- wherein the first end of the at least one nanotube is connected to a first portion of the at least one circuit and the second end of the at least one nanotube is connected to a second portion of the at least one circuit.
Dependencies are inferred from the claim text.