Reflective liquid crystal display substrate with integrated reflection enhancing and alignment layers
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorHui-Lun Chen
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Abstract
Within a reflective liquid crystal on silicon display image array optoelectronic microelectronic fabrication there is employed a polyimide alignment layer formed upon a reflection enhancing layer. The reflective liquid crystal on silicon display image array optoelectronic microelectronic fabrication is fabricated with enhanced liquid crystal material alignment and enhanced contrast.
Claims19
A liquid crystal optoelectronic microelectronic fabrication comprising:
- a substrate;
- a reflective electrode formed over the substrate;
- a silicon oxide layer formed upon the reflective electrode;
- and
- a polyimide alignment layer formed upon the silicon oxide layer.
A liquid crystal optoelectronic microelectronic fabrication comprising:
- a substrate;
- a reflective electrode formed over the substrate;
- at least one pair of a silicon nitride layer formed upon a silicon oxide layer formed upon the reflective electrode;
- and
- a polyimide alignment layer formed upon the silicon nitride layer.
A liquid crystal optoelectronic microelectronic fabrication comprising:
- a substrate;
- a reflective electrode formed over the substrate;
- at least one pair of a silicon nitride layer formed upon a silicon oxide layer formed upon the reflective electrode;
- an additional silicon oxide layer formed upon the silicon nitride layer;
- and
- a polyimide alignment layer formed upon the silicon nitride layer.
A method for fabricating a liquid crystal optoelectronic microelectronic fabrication comprising:
- providing a substrate;
- forming over the substrate a reflective electrode;
- forming upon the reflective electrode a silicon oxide layer;
- and
- forming upon the silicon oxide layer a polyimide alignment layer.
A method for fabricating a liquid crystal optoelectronic microelectronic fabrication comprising:
- providing a substrate;
- forming over the substrate a reflective electrode;
- forming upon the reflective electrode at least one pair of a silicon nitride layer formed upon a silicon oxide layer formed upon the reflective electrode;
- and
- forming upon the silicon nitride layer a polyimide alignment layer.
A method for forming a liquid crystal optoelectronic microelectronic fabrication comprising:
- providing a substrate;
- forming over the substrate a reflective electrode;
- forming upon the reflective electrode at least one pair of a silicon nitride layer formed upon a silicon oxide layer formed upon the reflective electrode;
- forming an additional silicon oxide layer upon the silicon nitride layer;
- and
- forming a polyimide alignment layer upon the silicon nitride layer.
Dependencies are inferred from the claim text.